Employing constant photocurrent method for the study of defects in silicon thin films

Subject Areas : Journal of Theoretical and Applied Physics

Hitendra K. Malik ¹ , Sucheta Juneja ² , Sushil Kumar ³

1 - Plasma Science and Technology Laboratory, Department of Physics, Indian Institute of Technology Delhi
2 - Plasma Science and Technology Laboratory, Department of Physics, Indian Institute of Technology Delhi
3 - Physics of Energy Harvesting Division, National Physical Laboratory

Accepted : 2019-06-01 Published : 2019-06-01

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