Chromium oxide (α-Cr2O3) thin films were prepared using thermal annealing of chromium (Cr)films deposited on quartz substrates by direct current (DC) magnetron sputtering. The annealingprocess of the films was performed for different times of 60, 120,180 and 240 min. The influenceof annealing time on structural, morphological and optical properties of the prepared films wasinvestigated by different analysis including X-ray diffraction (XRD), atomic force microscopy(AFM) and spectrophotometry. The XRD patterns showed that upon thermal annealing the Crfilms transformed to (α-Cr2O3) and the annealing time has a profound effect on crystallinestructure of chromium oxide films. According to AFM results, the films surface morphologieswere strongly dependent on annealing time and an increase in annealing time led to an increasein the grain size as well as in the surface roughness. The transmittance of the as deposited filmwas found very low and it improved after annealing. تفاصيل المقالة